Equipment

1500 sq. ft. clean room in a 3000 sq. ft. laboratory located in the School of Engineering.

• Newly remodeled (Summer 2006)
• Card-swipe access to authorized users only
• Equipment use coordinated by lab manager
• Authorized users have personalized accounts to equipment

This facility is a 1300 sq. ft. leased lab space located in NASA Ames Research Center, which features the following:

• Plasma-enhanced chemical vapor deposition (PECVD) system
• Magnetron sputtering system
• Scanning electron microscope (SEM) with electron beam deposition capability
• Thermal imaging system for nanoscale devices
• Thermal interface materials (TIM) resistance measurement system
• Chemical fume hood
• De-ionized water
• Compressed air and natural gas lines

High-resolution field-emission scanning electron microscope (SEM): Hitachi S-4800

• High-resolution 1.0 nm at 10 kV / 2.0 nm at 1.0 kV
• Chemical analysis through Energy Dispersive X-ray (EDX) spectroscopy
• Scanning Transmission Electron Microscopy (STEM) for cross-sectional imaging

Water probe station (Cascade Microtech 12000 series) & Current-voltage (I-V), capacitance-voltage (C-V), and high-frequency characteristics of nanostructures

• Temperature controller (-65°C to 200°C)
• Semiconductor parameter analyzer (Agilent 4156C)
• Impedance analyzer (Agilent 4294A)
• Vector network analyzer (up to 65GHz) (Anritsu)

High-resolution scanning probe microscope for nanostructure surface characterization

• Noise and vibration isolation bench

Full range of SPM techniques

• Electrical characterization measurements
• Electric Force Microscopy (EFM) (tapping mode)
• Tunnel AFM (TUNA) (contact mode)
• Conductive Atomic Force Microscopy (CAFM) (contact mode)
• Scanning Spreading Resistance Microscopy (SSRM) (contact mode)
• Scanning Capacitance Microscopy (SCM) (contact)
• Multi-channel output